2017 Federal Poly Offa ND (Full-Time) Post-UTME Form Out With 150 as Cut off Mark

Do you applied for admission into OFFAPOLY through UTME and has been waiting for when the Post UTME screening form would be out on sale? It is our pleasure to inform the general public that the Federal Polytechnic, Offa, OFFAPOLY post UTME screening exercise application form for the 2017/2018 academic session is now on sale. The cut off mark for OFFAPOLY is 150.

This is to inform candidates who choose Federal Polytechnic, Offa in the JAMB 2017 UTME that the screening will hold from Monday 18th to Friday 22nd September, 2017, in the Polytechnic Main Campus.

Eligibilty for admission into Federal Polytechnic Offa Post UTME Screening

The following categories of candidates are eligible to participate in the screening exercise.

All Candidates who scored 150 and above in the 2017 JAMB UTME and who made Federal Polytechnic, Offa as their First and Second Choice Institution are expected to participate in the screening exercise.

Steps on How to Apply for Federal Polytechnic Offa Post UTME

1. All applicants for screening are to visit http://portal.fpo.edu.ng, and make payment of N2, 000 with an ATM card that is inter switch compatible between Wednesday 6th and Sunday 17th September, 2017.

2. Fill required information, including O’level result(s), upload scanned copies of result(s)/certificate(s), state of origin and birth certificate and print out screening summary report. Candidates are required to come with Original and photocopy(s) of their SSCE results and appropriate scratch cards for the screening of their results.

3.Please note that any candidate who fails to participate in the screening exercise will not be considered for admission in the Polytechnic, and any false data entry during the online registration for screening will lead to disqualification of the candidate at any time so discovered.

4. All candidates are enjoined to visit the Polytechnic’s Website www.fpo.edu.ng for appropriate entry requirements for programmes of their choice and other relevant information.